The ELI Beamlines Facility has completed the new ELIAS laboratory for the deposition of thin multi-layers on large-scale optics for high-power lasers. This is one of the largest such systems in the world, serving ultra-intense laser optics.
The motivation for constructing the new ELIAS optical laboratory is to meet the supply needs for delivering highly durable and precise optics for all three ELI facilities and partner research institutions. Electron beam evaporation assisted by ion plasma will be used to deposit large flat mirrors for the transport of ultrashort beams, focusing mirrors, highly demanding diffraction gratings or anti-reflective layers with high damage thresholds. The maximum size of a single optic is 1200 mm with a weight of up to 250 kg.
The laboratory will support the further development of multi-petawatt laser systems, enabling progress in ultra-intense laser technologies. The ELIAS laboratory will play a key role in the global advancement of high-intensity laser systems, ensuring the production of optics that meet the highest scientific and technological standards.
The modular design of the chamber also allows for the development of advanced nanostructured layers known as GLAD (Glancing Angle Deposition) with very high damage thresholds for optics up to 500 mm in diameter. These layers are particularly valuable for their ability to tailor the optical properties of surfaces, making them suitable for high-performance laser applications and experimental setups requiring specialized optical components.
After commissioning of the ELIAS system, test depositions with, among other things, gold nanolayers were created as prototypes of mirrors for the 10 PW ATON laser transport. The samples were successfully validated over the entire 1.2 m aperture including laser immunity at 110 femtosecond pulses.
In addition to supporting scientific progress, this new capability will also be directed toward fostering collaboration with industry and commercialization activities at ELI. The laboratory will enable the development of cutting-edge optical materials and components for industrial applications, helping to bridge the gap between fundamental research and practical commercial technologies.
„We are excited that ELIAS allows us to further develop collaborations on the development of special dielectric layers with research centres in Europe, USA, Japan and Korea. As well as cooperation with industrial companies on the development of new laser systems, says Daniel Kramer, the Group leader of Optical Materials Development.
The establishment of the laboratory and the development of its processes were supported by the IMPULSE and THRILL projects, funded by the Horizon Europe program, and by financial resources from the ELI ERIC consortium. The design and development involved the ELI Beamlines Optics group (T. Tolenis, D. Kramer) and the companies Vacuum Innovations LLE, Streicher s.r.o., CCR GmbH and Coherent Technologies, along with the technical teams from the ELI Beamlines technical teams (R. Kuřátko, A. Pokorný, L. Nims, V. Gaman, P. Kemény).
